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High-Resolution Plasma Spectroscopy with Avantes: Advanced Optical Emission Solutions for Accurate Elemental Analysis
Plasma forms when a molecule’s atomic shell breaks down under continuous energy application beyond the gaseous state, resulting in a cloud of ionized, or charged, particles. Each element on the periodic table has a unique spectral signature, which can be monitored using optical emission spectroscopy (OES). This powerful technique enables the identification of the atomic elements present in a plasma sample and can detect any changes or additions to its composition.
Plasma measurements produce numerous spectral peaks. Avantes offers a cost-effective solution to separate these peaks with its modular design and multi-channel capability, outperforming traditional, more expensive OES systems. With a multichannel array, each instrument covers a narrow wavelength range at an exceptionally high resolution. These instruments are connected via fiber optics, converging at a single collection terminal.
For plasma and optical emission spectroscopy, Avantes provides two preconfigured instrument bundles: a four-channel system and an ultra-high-resolution eight-channel setup, perfect for desktop or rack-mount installations. Alternatively, collaborate with Avantes’ expert sales engineers to customize a system tailored to your specific plasma measurement needs.
Explore Avantes’ cutting-edge solutions for plasma spectroscopy, optical emission spectroscopy, and high-resolution spectral analysis to optimize your scientific measurements.
The Role of Optical Emission Spectroscopy (OES) in Plasma Process Control
Optical Emission Spectroscopy (OES) is a critical tool for controlling plasma processes in industries such as semiconductor and photovoltaic manufacturing. OES is frequently used in physical vapor deposition (PVD) and plasma-enhanced vapor deposition (PEVD) to monitor the deposition of thin films on silicon wafers, which are essential for producing high-quality semiconductors and solar cells.
Additionally, OES is valuable for endpoint detection during the etching of photoresist, a light-reactive material. This ensures precision in removing material during the formation of patterned coatings on surfaces, such as printed circuit boards. OES also plays a role in contamination monitoring within lithography systems, ensuring the accuracy and integrity of the manufacturing process.
In the biochemical industry, optical emission spectroscopy is utilized to monitor plasma deposition of films that enhance the biocompatibility of medical implants. This technology ensures the successful integration of implants with human tissue by improving surface properties.
Whether for semiconductor manufacturing, biochemical applications, or plasma process control, OES offers real-time monitoring and high precision, making it an essential tool in advanced industries.
